18 December 2012 High numerical aperture silicon collimating lens for mid-infrared quantum cascade lasers manufactured using wafer-level techniques
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Abstract
We present an aspheric collimating lens for mid-infrared (4-14 μm) quantum cascade lasers. The lenses were etched into silicon by an inductively coupled plasma reactive ion etching system on wafer level. The high refractive index of silicon reduces the height of the lens profile resulting in a simple element working at high numerical aperture (up to 0.82). Wafer level processes enable the fabrication of about 5000 lenses in parallel. Such cost-effective collimating lens is a step towards the adoption of quantum cascade lasers for all its potential applications.
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Eric Logean, Eric Logean, Lubos Hvozdara, Lubos Hvozdara, Joab Di-Francesco, Joab Di-Francesco, Hans Peter Herzig, Hans Peter Herzig, Reinhard Voelkel, Reinhard Voelkel, Martin Eisner, Martin Eisner, Pierre-Yves Baroni, Pierre-Yves Baroni, Michel Rochat, Michel Rochat, Antoine Müller, Antoine Müller, } "High numerical aperture silicon collimating lens for mid-infrared quantum cascade lasers manufactured using wafer-level techniques", Proc. SPIE 8550, Optical Systems Design 2012, 85500Q (18 December 2012); doi: 10.1117/12.981165; https://doi.org/10.1117/12.981165
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