18 December 2012 In situ aberration measurement technique based on aerial image with optimized source
Author Affiliations +
Proceedings Volume 8550, Optical Systems Design 2012; 85503N (2012); doi: 10.1117/12.981334
Event: SPIE Optical Systems Design, 2012, Barcelona, Spain
Abstract
An in-situ aberration measurement technique based on aerial image with optimized source is proposed. A linear relationship between aerial image and Zernike coefficients is established by principle component analysis and regression analysis. The linear relationship is used to extract aberrations. The impacts of the source on regression matrix character and the Zernike aberrations measurement accuracy are analyzed. An evaluation function for the aberrations measurement accuracy is introduced to optimize the source. Parameters of the source are optimized by the evaluation function using the simulators Dr.LiTHO and PROLITH. Then the optimized source parameters are adopted in our method. Compared with the previous aberration measurement technique based on principal component analysis of aerial image (AMAI-PCA), the number terms of Zernike coefficients that can be measured are increased from 7 to 27, and the Zernike aberrations measurement accuracy is improved by more than 20%.
© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Guanyong Yan, Xiangzhao Wang, Sikun Li, Jishuo Yang, Dongbo Xu, Lifeng Duan, Anatoly Y. Bourov, Andreas Erdmann, "In situ aberration measurement technique based on aerial image with optimized source", Proc. SPIE 8550, Optical Systems Design 2012, 85503N (18 December 2012); doi: 10.1117/12.981334; https://doi.org/10.1117/12.981334
PROCEEDINGS
12 PAGES


SHARE
KEYWORDS
Matrices

Lithographic illumination

Image processing

Lithography

Artificial intelligence

Error analysis

Principal component analysis

RELATED CONTENT


Back to Top