27 November 2012 Design of planar lightwave interleavers based on Echelle gratings structure
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Abstract
This paper reports the design procedure of planar lightwave interleavers based on Echelle gratings structure, introduces two methods to eliminate the device aberration, two-point aberration-free design and elliptical grating facets design. Simulation results show that the device insertion loss and crosstalk can be effectively reduced by aberration compensation design. Design example is given in this paper. The 50/100GHz and 100/200GHz interleavers are fabricated on the SOI (Silicon-on-insulator) materials. As compared to other solutions, they are smaller and compact in structure.
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Wenkai Liu, Wenkai Liu, Baoqun Li, Baoqun Li, Xiaowei Dong, Xiaowei Dong, } "Design of planar lightwave interleavers based on Echelle gratings structure", Proc. SPIE 8555, Optoelectronic Devices and Integration IV, 855524 (27 November 2012); doi: 10.1117/12.981789; https://doi.org/10.1117/12.981789
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