Computer simulation and optimization design of the holographic photonic crystal template fabrication process

Ying Liu

doi:10.1117/12.999715

26 November 2012 Computer simulation and optimization design of the holographic photonic crystal template fabrication process

Ying Liu

Author Affiliations +

Proceedings Volume 8556, Holography, Diffractive Optics, and Applications V; 85561C (2012) https://doi.org/10.1117/12.999715
Event: Photonics Asia, 2012, Beijing, China

Abstract

According to the holographic theory, the influence factors in fabricating photonic crystal templates in photoresist such as the arrangement of interference beam, exposure and developing process and the polarization direction adjustment were discussed in this paper. The fabrication process was simulated by computer program and the optimization parameters of fabricating three-dimensional photonic crystal templates in photoresist were presented.

Citation Download Citation

Ying Liu "Computer simulation and optimization design of the holographic photonic crystal template fabrication process", Proc. SPIE 8556, Holography, Diffractive Optics, and Applications V, 85561C (26 November 2012); https://doi.org/10.1117/12.999715

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