Diffraction grating is a high-resolution dispersion optical element. It has been widely used as the key component in
optical spectroscopy, telecommunication multiplexing and laser systems, etc. Recently there is a growing demand for
large-sized diffraction gratings in spectrometers industry, laser fusion facility, and its fabrication method is also a hot
topic now. To fabricate large sized gratings, we have developed a grating imaging scanning lithography system. In this
technology, the phase grating with jagged edge is used to generate diffractive beams and the spatial filter is used to select
±1 order diffractive beams. Then two-beam interference on the substrate forms the grating fringes. At the same time, a
4f-system is used to form an identical image with clear boundary in the interference area. A high precision twodimensional
mobile station, which enables the accurate positioning and move of the substrate, is utilized for
complementary cyclical scanning, thus the image stitching errors are effectively eliminated. With this technology, we
have fabricated a grating with period of 20μm and size of 100mm×100mm. In this paper the grating imaging scanning
lithography procedure is described step by step. The principles and the experimental results are also explained in detail.
With the characteristics of a simple structure, high energy utilization and stability, this new lithography technology
should be an efficient way to fabricate large sized grating in the future.