Antireflective structures fabricated from silica nanoparticles with regular arrangement

Yukun Zhang; Yan Liu; Hui Pang; Lifang Shi; Xiaochun Dong; Qiling Deng; Jinglei Du; Shaoyun Yin; Chunlei Du

doi:10.1117/12.999475

20 November 2012 Antireflective structures fabricated from silica nanoparticles with regular arrangement

Yukun Zhang, Yan Liu, Hui Pang, Lifang Shi, Xiaochun Dong, Qiling Deng, Jinglei Du, Shaoyun Yin, Chunlei Du

Proceedings Volume 8564, Nanophotonics and Micro/Nano Optics; 85641I (2012) https://doi.org/10.1117/12.999475
Event: Photonics Asia, 2012, Beijing, China

Abstract

Novel antireflective surfaces with silica particles arranged regularly and tightly are proposed and fabricated by self assemble silica nanoparticle through electrostatic attraction between charged colloidal particles and charged polyelectrolyte multilayer. Due to regularly arrangement of the particles, the nanoparticle coatings, as homogeneous porous layers with uniform distribution, show high-quality and uniform antireflective capability in each region on the substrate. It has been sufficiently demonstrated in our experiments. Furthermore, the relations among the antireflective capability, average size of nanoparticles, and incident angle of the irradiated light are calculated by finite-difference time-domain method. It is demonstrated that the nanostructure coatings with particles of 100 nm size possess the excellently suitable performance for reflection/transmission with respect to visible-light region. From the results, the fabricated anti-reflective nanostructures have great potential to improve the efficiency of optoelectronic devices such as a photo-detector and solar cells.

Citation Download Citation

Yukun Zhang, Yan Liu, Hui Pang, Lifang Shi, Xiaochun Dong, Qiling Deng, Jinglei Du, Shaoyun Yin, and Chunlei Du "Antireflective structures fabricated from silica nanoparticles with regular arrangement", Proc. SPIE 8564, Nanophotonics and Micro/Nano Optics, 85641I (20 November 2012); https://doi.org/10.1117/12.999475

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