20 November 2012 A cost-effective method for fabricating antireflection structure using self-agglomerated metal nanoparticles as etching mask
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Abstract
A cost-effective method, using reactive ion etch (RIE) process to etch Si with Ag nanoparticle mask for fabricating antireflection structure, is proposed. The formation of Ag nanoparticle adopts wet-chemical method to deposit Ag layer on Si substrate, and then through rapid thermal annealing of Ag at 200°C-600°Crange, Ag nanoparticle were formed on Si substrate. Effects of parameters including etching parameters and deposited factors were investigated. According to analysis result of experiment, a group of high performance antireflection structure parameters was obtained.
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Xiaoxuan Dong, Su Shen, Renjin Shao, Linsen Chen, "A cost-effective method for fabricating antireflection structure using self-agglomerated metal nanoparticles as etching mask", Proc. SPIE 8564, Nanophotonics and Micro/Nano Optics, 856427 (20 November 2012); doi: 10.1117/12.999910; https://doi.org/10.1117/12.999910
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