9 March 2013 High quality surface micromachining of LiNbO3 by ion implantation-assisted etching
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Abstract
A surface micromachining technique of LiNbO3 substrates, based on an improved implantation-assisted wet etching process, will be presented and discussed. 2.3 μm high relief structures with optical quality surfaces were fabricated on LiNbO3 by 5 MeV Cu ion implantation through an SU-8 10 μm thick photoresist masking layer patterned by a standard photolithographic process. The LiNbO3 regions amorphized by implantation were etched in a 49% HF aqueous solution at a rate of 100 nm/s exploiting the high differential etching rate between damaged and undamaged LiNbO3 (100 nm/s against 1 nm/s). The process can be repeated to obtain higher aspect ratios. In this work the results of both single and double step processes will be presented. The sidewalls morphology of the microstructures will be also discussed. Both the surface quality and features of the manufactured structures make this technology highly promising for integrated optics and acousto/opto-fluidics.
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Simone Sugliani, Simone Sugliani, Pietro De Nicola, Pietro De Nicola, Giovanni Battista Montanari, Giovanni Battista Montanari, Alessio Nubile, Alessio Nubile, Angela Menin, Angela Menin, Fulvio Mancarella, Fulvio Mancarella, Paolo Vergani, Paolo Vergani, Andrea Meroni, Andrea Meroni, Marco Astolfi, Marco Astolfi, Marco Borsetto, Marco Borsetto, Guido Consonni, Guido Consonni, Roberto Longone, Roberto Longone, Marco Chiarini, Marco Chiarini, Marco Bianconi, Marco Bianconi, Gian Giuseppe Bentini, Gian Giuseppe Bentini, } "High quality surface micromachining of LiNbO3 by ion implantation-assisted etching", Proc. SPIE 8612, Micromachining and Microfabrication Process Technology XVIII, 86120E (9 March 2013); doi: 10.1117/12.2002095; https://doi.org/10.1117/12.2002095
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