5 March 2013 Precisely controlled plasmonic nanostructures and its application to nanolithography
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Abstract
Nanoparticles of noble metals show localized surface plasmon resonance. Plasmon resonances which are collective oscillations of conduction electrons give rise to the enhancement of electromagnetic field to the local surface of metallic nanoparticles. Therefore, various plasmonic near-field lithography systems were proposed so far. Here, we report on a plasmon-assisted nanolithography used for the fabrication of nano-patterns with nanometric accuracy. The lithography system can form deep nano-patterns on positive photoresist film using scattering component of multipole plasmon resonances as an exposure light. Two-photon-induced reaction of a photoresist enabled the formation of fine patterns even using plasmonic scattering light.
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K. Ueno, K. Ueno, H. Misawa, H. Misawa, } "Precisely controlled plasmonic nanostructures and its application to nanolithography", Proc. SPIE 8613, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VI, 861302 (5 March 2013); doi: 10.1117/12.2003316; https://doi.org/10.1117/12.2003316
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