5 March 2013 Nanoscale patterning of colloidal quantum dots for surface plasmon generation
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The patterning of colloidal quantum dots with nanometer resolution is essential for their application in photonics and plasmonics. Several patterning approaches, such as the use of polymer composites, molecular lock-and-key methods, inkjet printing, and microcontact printing of quantum dots, have limits in fabrication resolution, positioning and the variation of structural shapes. Herein, we present an adaptation of a conventional liftoff method for patterning colloidal quantum dots. This simple method is easy and requires no complicated processes. Using this method, we formed straight lines, rings, and dot patterns of colloidal quantum dots on metallic substrates. Notably, patterned lines approximately 10 nm wide were fabricated. The patterned structures display high resolution, accurate positioning, and well-defined sidewall profiles. To demonstrate the applicability of our method, we present a surface plasmon generator elaborated from quantum dots.
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Yeonsang Park, Yeonsang Park, Young-Geun Roh, Young-Geun Roh, Un Jeong Kim, Un Jeong Kim, Dae-Young Chung, Dae-Young Chung, Hwansoo Suh, Hwansoo Suh, Jineun Kim, Jineun Kim, Sangmo Cheon, Sangmo Cheon, Jaesoong Lee, Jaesoong Lee, Tae-Ho Kim, Tae-Ho Kim, Kyung-Sang Cho, Kyung-Sang Cho, Chang-Won Lee, Chang-Won Lee, "Nanoscale patterning of colloidal quantum dots for surface plasmon generation", Proc. SPIE 8613, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VI, 861305 (5 March 2013); doi: 10.1117/12.2003055; https://doi.org/10.1117/12.2003055

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