5 March 2013 III-V access waveguides using atomic layer deposition
Author Affiliations +
Abstract
Normally, the larger refractive index contrast of silicon-on-insulator (SOI) photonics used for transporting highly confined optical modes is not available in compound semiconductor systems because the optically active layer rests upon an epitaxial support layer having a similar refractive index. Here, a semiconductor-under-insulator (SUI) technology for compound semiconductor membrane photonic circuitry is presented. It will be shown that such a technology can facilitate the transport of highly confined optical modes in compound semiconductor systems and is anticipated to be a critical part of future scalable quantum photonics applications.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Khaled Mnaymneh, Simon Frédérick, Dan Dalacu, Jean Lapointe, Philip J. Poole, Robin L. Williams, "III-V access waveguides using atomic layer deposition", Proc. SPIE 8613, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VI, 86130D (5 March 2013); doi: 10.1117/12.2004310; https://doi.org/10.1117/12.2004310
PROCEEDINGS
5 PAGES


SHARE
Back to Top