5 March 2013 Fabrication of subwavelength holes using nanoimprint lithography
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Driven by the demand of miniaturized and highly integrated functionalities in the area of photonics and photonic circuits, the metal or plasmon optics has become a promising method for manipulating light at the nanometer scale. Especially the application of periodic sub wavelength hole structures within an opaque metal film on a dielectric substrate holds many advantages for the realization of optical filters, since the variation of the hole diameter and the periodicity allows a selective filter response. This paper is concerned with the modeling, fabrication and characterization of a sub wavelength hole array for surface plasmon enhanced transmission of light [1]. The theoretical backgrounds as well as the basics of the simulation by Finite-Difference Time-Domain (FDTD) are described for the target structure with a hole diameter of 180 nm and a periodicity of 400 nm. By using a double-molding technology via nanoimprint lithography the fabrication of this sub wavelength hole array with a peak wavelength of 470 nm and full width at half maximum of 50 nm from a silicon nanopillar master is demonstrated. In order to ensure the dimensional stability of the molded structures, characterization was consequently done by means of a self made non-contact mode atomic force microscope.
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A. Weiss, A. Weiss, J. Besser, J. Besser, M. Baum, M. Baum, R. Saupe, R. Saupe, T. Otto, T. Otto, T. Gessner, T. Gessner, "Fabrication of subwavelength holes using nanoimprint lithography", Proc. SPIE 8613, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VI, 86131N (5 March 2013); doi: 10.1117/12.2014273; https://doi.org/10.1117/12.2014273

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