4 March 2013 HVPE-GaN growth on ammonothermal GaN crystals
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Abstract
HVPE crystallization on ammonothermaly grown GaN crystals (A-GaN) is described. Preparation of the (0001) surface of the A-GaN crystals to the epi-ready state is presented. The HVPE initial growth conditions are determined and demonstrated. An influence of a thickness and a free carrier concentration in the initial substrate on quality and mode of growth by the HVPE is examined. Smooth GaN layers of excellent crystalline quality, without cracks, and with low dislocation density are obtained.
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Tomasz Sochacki, Mikolaj Amilusik, Boleslaw Lucznik, Michal Boćkowski, Janusz L. Weyher, Grzegorz Nowak, Bogdan Sadovyi, Grzegorz Kamler, Izabella Grzegory, Robert Kucharski, Marcin Zajac, Robert Doradzinski, Robert Dwilinski, "HVPE-GaN growth on ammonothermal GaN crystals", Proc. SPIE 8625, Gallium Nitride Materials and Devices VIII, 86250B (4 March 2013); doi: 10.1117/12.2003699; https://doi.org/10.1117/12.2003699
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