18 March 2013 Effect of deposition conditions on the stoichiometry and structural properties of LiNbO3 thin films deposited by MOCVD
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Proceedings Volume 8626, Oxide-based Materials and Devices IV; 862612 (2013) https://doi.org/10.1117/12.2010105
Event: SPIE OPTO, 2013, San Francisco, California, United States
Abstract
Epitaxial LiNbO3 thin films were deposited on C-sapphire substrates by pulsed injection metal organic chemical vapor deposition and atmospheric pressure metal organic chemical vapor deposition. The effect of deposition conditions, such as the ratio of Li/Nb precursors in solution and the deposition pressure, on the phase composition, Li nonstoichiometry, texture, epitaxial quality, residual stresses and formation of twins in LiNbO3 films was studied by means of X-ray diffraction and Raman spectroscopy. It was found that the deposition pressure played an important role in the incorporation of Li2O in the film and the formation of in-plane and out-of-plane twins.
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Samuel Margueron, Ausrine Bartasyte, Valentina Plausinaitiene, Adulfas Abrutis, Pascal Boulet, Virgaudas Kubilius, Zita Saltyte, "Effect of deposition conditions on the stoichiometry and structural properties of LiNbO3 thin films deposited by MOCVD", Proc. SPIE 8626, Oxide-based Materials and Devices IV, 862612 (18 March 2013); doi: 10.1117/12.2010105; https://doi.org/10.1117/12.2010105
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