18 March 2013 Optimizing anatase-TiO2 deposition for low-loss planar waveguides
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Proceedings Volume 8626, Oxide-based Materials and Devices IV; 86261D (2013) https://doi.org/10.1117/12.2005169
Event: SPIE OPTO, 2013, San Francisco, California, United States
Abstract
Polycrystalline anatase-TiO2 thin film possesses desirable properties for on-chip photonic devices that can be used for optic computing, communication, and sensing. Low-loss anatase-TiO2 thin films are necessary for fabricating high quality optical devices. We studied anatase-TiO2 by reactively sputtering titanium metal in an oxygen environment and annealing. By correlating key deposition parameters, including oxygen flow rate, deposition pressure, RF power, and temperature to film morphology and planar waveguiding losses, we aim to understand the dominant source of propagation losses in TiO2 thin films and achieve higher quality, lower-loss films.
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Lili Jiang, Christopher C. Evans, Orad Reshef, Eric Mazur, "Optimizing anatase-TiO2 deposition for low-loss planar waveguides", Proc. SPIE 8626, Oxide-based Materials and Devices IV, 86261D (18 March 2013); doi: 10.1117/12.2005169; https://doi.org/10.1117/12.2005169
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