14 March 2013 A highly accurate engineering of silicon integrated microring resonators based on the nanofabrication technique
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Proceedings Volume 8629, Silicon Photonics VIII; 86291J (2013) https://doi.org/10.1117/12.2007266
Event: SPIE OPTO, 2013, San Francisco, California, United States
Abstract
In this work we present our theoretical and experimental study on the technique for the fine modification of a silicon integrated microring resonator spectral response. The method involves the local atomic layer deposition of a thin TiO2 overlayer and is applicable for standard nanophotonic waveguides. The approach is based on the dispersion management due to the specific dispersion properties brought by the thin TiO2 film deposition. In addition, the technique is able to partially compensate the fabrication imperfections and reduce the propagation losses.
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M. Erdmanis, M. Erdmanis, L. Karvonen, L. Karvonen, A. Säynätjoki, A. Säynätjoki, S. Honkanen, S. Honkanen, I. Tittonen, I. Tittonen, } "A highly accurate engineering of silicon integrated microring resonators based on the nanofabrication technique", Proc. SPIE 8629, Silicon Photonics VIII, 86291J (14 March 2013); doi: 10.1117/12.2007266; https://doi.org/10.1117/12.2007266
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