A highly accurate engineering of silicon integrated microring resonators based on the nanofabrication technique

M. Erdmanis; L. Karvonen; A. Säynätjoki; S. Honkanen; I. Tittonen

doi:10.1117/12.2007266

Translator Disclaimer

14 March 2013 A highly accurate engineering of silicon integrated microring resonators based on the nanofabrication technique

M. Erdmanis, L. Karvonen, A. Säynätjoki, S. Honkanen, I. Tittonen

Author Affiliations +

Proceedings Volume 8629, Silicon Photonics VIII; 86291J (2013) https://doi.org/10.1117/12.2007266
Event: SPIE OPTO, 2013, San Francisco, California, United States

Abstract

In this work we present our theoretical and experimental study on the technique for the fine modification of a silicon integrated microring resonator spectral response. The method involves the local atomic layer deposition of a thin TiO₂ overlayer and is applicable for standard nanophotonic waveguides. The approach is based on the dispersion management due to the specific dispersion properties brought by the thin TiO₂ film deposition. In addition, the technique is able to partially compensate the fabrication imperfections and reduce the propagation losses.

Citation Download Citation

M. Erdmanis, L. Karvonen, A. Säynätjoki, S. Honkanen, and I. Tittonen "A highly accurate engineering of silicon integrated microring resonators based on the nanofabrication technique", Proc. SPIE 8629, Silicon Photonics VIII, 86291J (14 March 2013); https://doi.org/10.1117/12.2007266

ACCESS THE FULL ARTICLE