A highly accurate engineering of silicon integrated microring resonators based on the nanofabrication technique

M. Erdmanis; L. Karvonen; A. Säynätjoki; S. Honkanen; I. Tittonen

doi:10.1117/12.2007266

14 March 2013 A highly accurate engineering of silicon integrated microring resonators based on the nanofabrication technique

M. Erdmanis, L. Karvonen, A. Säynätjoki, S. Honkanen, I. Tittonen

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Proceedings Volume 8629, Silicon Photonics VIII; 86291J (2013) https://doi.org/10.1117/12.2007266
Event: SPIE OPTO, 2013, San Francisco, California, United States

Abstract

In this work we present our theoretical and experimental study on the technique for the fine modification of a silicon integrated microring resonator spectral response. The method involves the local atomic layer deposition of a thin TiO₂ overlayer and is applicable for standard nanophotonic waveguides. The approach is based on the dispersion management due to the specific dispersion properties brought by the thin TiO₂ film deposition. In addition, the technique is able to partially compensate the fabrication imperfections and reduce the propagation losses.

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M. Erdmanis, M. Erdmanis, L. Karvonen, L. Karvonen, A. Säynätjoki, A. Säynätjoki, S. Honkanen, S. Honkanen, I. Tittonen, I. Tittonen, } "A highly accurate engineering of silicon integrated microring resonators based on the nanofabrication technique", Proc. SPIE 8629, Silicon Photonics VIII, 86291J (14 March 2013); doi: 10.1117/12.2007266; https://doi.org/10.1117/12.2007266

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