The influence of pH of the precursor solution on TiO2 films under hydrothermal synthesis

L. Xia; Z. H. Feng; H. T. Dai; S. G. Wang; X. W. Sun

doi:10.1117/12.2003018

1 March 2013 The influence of pH of the precursor solution on TiO₂ films under hydrothermal synthesis

L. Xia, Z. H. Feng, H. T. Dai, S. G. Wang, X. W. Sun

Proceedings Volume 8643, Advances in Display Technologies III; 86430L (2013) https://doi.org/10.1117/12.2003018
Event: SPIE OPTO, 2013, San Francisco, California, United States

Abstract

As a fine material widely used in solar cells, electrochromic devices and an excellent photocatalyst, Titanium dioxide (TiO2) has attracted more and more attention. There are many factors that affect the properties of TiO2 thin films including reaction temperature, reaction time and concentration. The influence of the pH of the precursor solution on the formation of TiO2 thin films, however, has not been studied thoroughly. Involved in the solution such as Hydrochloric acid (HCl) or urea ((NH2)2CO) reagent, the pH of the solution can be controlled by the ratio of both. During the experiment, which involves the hydrolysis reaction of Ti3+, changing the pH of the solution will affect the speed of the reaction rate and film thickness. Therefore, the pH of the solution affects the surface morphology of the TiO2 thin films. The growth of TiO2 with different pH shows unequable states. Through the observation and characterization of the experimental results, we can optimize the pH of the growth environment.

Citation Download Citation

L. Xia, Z. H. Feng, H. T. Dai, S. G. Wang, and X. W. Sun "The influence of pH of the precursor solution on TiO₂ films under hydrothermal synthesis", Proc. SPIE 8643, Advances in Display Technologies III, 86430L (1 March 2013); https://doi.org/10.1117/12.2003018

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