]HF chemical laser with MOPA configuration is a good solution to achieve high output power with high reliability.
Kinetic models for HF amplifier are important for prediction and optimization of the performance of MOPA chemical
lasers. In this paper, a simplified model for HF chemical laser amplifier is presented. The main processes which are
included in the model are: (a) chemical pumping of HF (v=2) and HF (v=1), (b) stimulated transitions and spontaneous
emission. (c) relaxation of vibration excited HF molecule by H2,N2 and HF. Some assumptions are taken in this model:
(a) the density of H2, N2, HF, translational temperature and velocity of gas mixture are averaged across the laser cross
section, (b) only two vibration-rotational transitions (2P6, 1P7) occurs in the amplifier, (c) gas temperature does not
change during the lasing process in the amplifier. Based on these assumptions, a set of three-level rate equations is
formulated and then solved by an iterative technique. Comparison is made with recent experimentally obtained data from
a low power discharge-driven CW HF laser with MOPA configuration. It is shown that experimental results are
consistent with the calculation from the simplified model.