30 January 2013 Study on jitter of 30Hz surface discharge radiation source
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Proceedings Volume 8677, XIX International Symposium on High-Power Laser Systems and Applications 2012; 86771G (2013) https://doi.org/10.1117/12.2010619
Event: XIX International Symposium on High-Power Laser Systems and Applications, 2012, Istanbul, Turkey
Abstract
Surface discharge Radiation Source has been used as optical pumping source of XeF(C-A) gaseous laser. In previous works, discharge deposition power, transition efficiency and UV radiation intensity of surface discharge Radiation Source were mostly concerned, but the jitter of repetitively pulsed surface discharge was little studied. An optical pumping source by segmented surface discharge on Al2O3 ceramic substrate is developed to design stable XeF(C-A) laser with pulse repetitive mode. Distorted electric field near the surfaces of the ceramic substrate is calculated based on equivalent chain circuit model under conditions of charging voltage from 0 to 26.8kV, thickness of the substrate from 1mm to 3mm, and trigger pulse voltage from 47kV to 63kV. Analysis about trigger characteristics of pumping source is carried out, and influence of these conditions on discharge jitter is discussed. And discharge jitter is investigated in detail under different conditions. The experimental results show that discharge jitter decreases with increasing charging voltage and trigger pulse voltage, as well as decreasing thickness of ceramic substrate, and the pulse repetition rate has little influence on the discharge jitter in the range of 1Hz to 30Hz. These experimental results are coincident with numerical simulation results. Normally, the discharge jitter can be less than 30ns. Research results indicate that the optical pumping source has good time stability of repetitive pulse discharge.
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Chao Huang, Jing-ru Liu, Li Yu, Ying Tang, Xiao-xia An, Ai-ping Yi, Feng Zhu, Ke Huang, Lian-ying Ma, "Study on jitter of 30Hz surface discharge radiation source", Proc. SPIE 8677, XIX International Symposium on High-Power Laser Systems and Applications 2012, 86771G (30 January 2013); doi: 10.1117/12.2010619; https://doi.org/10.1117/12.2010619
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