11 December 2012 Lab-scale EUV nano-imaging employing a gas-puff-target source: image quality versus plasma radiation characteristics
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Proceedings Volume 8678, Short-Wavelength Imaging and Spectroscopy Sources; 867807 (2012) https://doi.org/10.1117/12.2006090
Event: Short-Wavelength Imaging and Spectroscopy, 2012, Bern, Switzerland
Abstract
In this chapter we report a desk-top microscopy reaching 50nm spatial resolution in very compact setup using a gas-puff laser plasma EUV source. We present the study of source bandwidth influence on the extreme ultraviolet (EUV) microscope spatial resolution. EUV images of object obtained by illumination with variable bandwidth EUV radiation were compared in terms of knife-edge spatial resolution to study the wide bandwidth parasitic influence on spatial resolution in the EUV microscopy.
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Przemyslaw Wachulak, Przemyslaw Wachulak, Andrzej Bartnik, Andrzej Bartnik, Henryk Fiedorowicz, Henryk Fiedorowicz, } "Lab-scale EUV nano-imaging employing a gas-puff-target source: image quality versus plasma radiation characteristics", Proc. SPIE 8678, Short-Wavelength Imaging and Spectroscopy Sources, 867807 (11 December 2012); doi: 10.1117/12.2006090; https://doi.org/10.1117/12.2006090
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