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1 April 2013 Investigation of EUV pellicle feasibility
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Abstract
EUV defectivity has been an important topic of investigation in past years. Today, the absence of a pellicle raises concerns for particle adders on reticle front side. A desire to improve defectivity on reticle front side via implementation of a pellicle could greatly assist in propelling EUV into high volume manufacturing. In this paper, we investigate a set of pellicle requirements and potential EUV pellicle materials. Further, we present experimental results of pellicle performance results and imaging results.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Luigi Scaccabarozzi, Dan Smith, Pedro Rizo Diago, Eric Casimiri, Nina Dziomkina, and Henk Meijer "Investigation of EUV pellicle feasibility", Proc. SPIE 8679, Extreme Ultraviolet (EUV) Lithography IV, 867904 (1 April 2013); https://doi.org/10.1117/12.2015833
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