8 April 2013 LPP-EUV light source development for high volume manufacturing lithography
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Since 2002, we have been developing a CO2-Sn-LPP EUV light source, the most promising solution as the 13.5 nm high power (>200 W) light source for HVM EUV lithography. Because of its high efficiency, power scalability and spatial freedom around plasma, we believe that the CO2-Sn-LPP scheme is the most feasible candidate as the light source for EUVL. By now, our group has proposed several unique original technologies such as CO2 laser driven Sn plasma generation, double laser pulse shooting for higher Sn ionization rate and higher CE, Sn debris mitigation with a magnetic field, and a hybrid CO2 laser system that is a combination of a short pulse oscillator and commercial cw-CO2 amplifiers. The theoretical and experimental data have clearly demonstrated the advantage of combining a laser beam at a wavelength of the CO2 laser system with Sn plasma to achieve high CE from driver laser pulse energy to EUV in-band energy. Combination of CO2 laser power and droplet generator improvements on new EUV chamber (Proto-2) enables stable EUV emission. EUV burst operation data shows stable average 10.2W(clean power @ I/F) EUV emission and maximum 20.3W(clean power @ I/F) was demonstrated. For future HVM the maximum of 4.7% CE with a 20 μm droplet are demonstrated by ps pre-pulse LPP. Also reported 40kW CO2 laser development project cooperate with Mitsubishi electric.
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Hakaru Mizoguchi, Hakaru Mizoguchi, Hiroaki Nakarai, Hiroaki Nakarai, Tamotsu Abe, Tamotsu Abe, Takeshi Ohta, Takeshi Ohta, Krzysztof M. Nowak, Krzysztof M. Nowak, Yasufumi Kawasuji, Yasufumi Kawasuji, Hiroshi Tanaka, Hiroshi Tanaka, Yukio Watanabe, Yukio Watanabe, Tsukasa Hori, Tsukasa Hori, Takeshi Kodama, Takeshi Kodama, Yutaka Shiraishi, Yutaka Shiraishi, Tatsuya Yanagida, Tatsuya Yanagida, Tsuyoshi Yamada, Tsuyoshi Yamada, Taku Yamazaki, Taku Yamazaki, Shinji Okazaki, Shinji Okazaki, Takashi Saitou, Takashi Saitou, "LPP-EUV light source development for high volume manufacturing lithography", Proc. SPIE 8679, Extreme Ultraviolet (EUV) Lithography IV, 86790A (8 April 2013); doi: 10.1117/12.2014139; https://doi.org/10.1117/12.2014139

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