1 April 2013 Application of phase shift focus monitor in EUVL process control
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Abstract
Both 90.9° and 180° phase shifts have been achieved using a new Phase Shift Mask (PSM) structure. This PSM is intended for use as a focus monitor. Both the EUV images of the focus monitor patterns on the new EUV PSM test mask, obtained from the SEMATECH/Berkeley Actinic Inspection Microscope (AIT), and the SEMATECH EUV Micro Exposure Tool (MET), shows that an alternating PSM EUV mask can be effectively used for EUVL focus monitoring.
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Lei Sun, Lei Sun, Sudhar Raghunathan, Sudhar Raghunathan, Vibhu Jindal, Vibhu Jindal, Eric Gullikson, Eric Gullikson, Pawitter Mangat, Pawitter Mangat, Iacopo Mochi, Iacopo Mochi, Kenneth A. Goldberg, Kenneth A. Goldberg, Markus P. Benk, Markus P. Benk, Oleg Kritsun, Oleg Kritsun, Tom Wallow, Tom Wallow, Deniz Civay, Deniz Civay, Obert Wood, Obert Wood, } "Application of phase shift focus monitor in EUVL process control", Proc. SPIE 8679, Extreme Ultraviolet (EUV) Lithography IV, 86790T (1 April 2013); doi: 10.1117/12.2011342; https://doi.org/10.1117/12.2011342
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