1 April 2013 Optics for ASML's NXE:3300B platform
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Abstract
Shipping in 2013, the NXE:3300 is the second generation of ASML’s EUV exposure platform. We review the current status of EUV optics production for the NXE:3300 tools. Four customer systems of the StarlithTM3300 series have been delivered so far. These sets of optics are characterized by a numerical aperture of 0.33 as well as significantly lower flare and wave-front levels compared to the StarlithTM3100. Meanwhile imaging down to 14 nm node features was demonstrated with the StarlithTM3300 pilot optics. Starting with this generation we introduce a fully new illumination system which allows for setting changes without efficiency loss. In this paper we focus on mirror fabrication and at wavelength qualification results of the optical systems produced so far. We also give an outline of potential solutions for the next generation of EUVL optics using higher NA.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Martin Lowisch, Martin Lowisch, Peter Kuerz, Peter Kuerz, Olaf Conradi, Olaf Conradi, Gero Wittich, Gero Wittich, Wolfgang Seitz, Wolfgang Seitz, Winfried Kaiser, Winfried Kaiser, } "Optics for ASML's NXE:3300B platform", Proc. SPIE 8679, Extreme Ultraviolet (EUV) Lithography IV, 86791H (1 April 2013); doi: 10.1117/12.2012158; https://doi.org/10.1117/12.2012158
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