1 April 2013 Roughness and variability in EUV lithography: Who is to blame? (part 1)
Author Affiliations +
Abstract
Process variability in today’s EUV lithography might be a showstopper for features below 27nm dimensions. At these feature sizes, electrical devices are influenced by quantum effects and thus have to face the discrete behavior of light and matter. More in general, lithography uncertainties arise from each lithographic element: the source, the photomask, the optical system, and the photoresist. In order to individually assess all the different contributions to the final resist roughness, a EUV mask with known absorber pattern variability was used to expose different resists at different process conditions. CD-SEM analyses were performed on both mask absorber and resist pattern and then used to build a stochastic resist model. In this first paper, we present a complete characterization of the root causes which are responsible of the CD nonuniformity for 27nm half-pitch dense contact-holes exposed with the ASML NXE:3100 scanner installed at imec. Using the same stochastic model, a simulated evaluation to quantify the possible impact of the different elements composing the lithographic process is performed at higher numerical aperture.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Alessandro Vaglio Pret, Alessandro Vaglio Pret, Roel Gronheid, Roel Gronheid, Todd R. Younkin, Todd R. Younkin, Gustaf Winroth, Gustaf Winroth, John J. Biafore, John J. Biafore, Yusuke Anno, Yusuke Anno, Kenji Hoshiko, Kenji Hoshiko, Vassilios Constantoudis, Vassilios Constantoudis, } "Roughness and variability in EUV lithography: Who is to blame? (part 1)", Proc. SPIE 8679, Extreme Ultraviolet (EUV) Lithography IV, 86792O (1 April 2013); doi: 10.1117/12.2011584; https://doi.org/10.1117/12.2011584
PROCEEDINGS
9 PAGES


SHARE
RELATED CONTENT

EUV contact holes and pillars patterning
Proceedings of SPIE (March 15 2015)
Study of overlay in EUV/ArF mix and match lithography
Proceedings of SPIE (April 17 2013)
Extension of practical k1 limit in EUV lithography
Proceedings of SPIE (March 17 2016)
Impact of mask line roughness in EUV lithography
Proceedings of SPIE (April 07 2011)

Back to Top