Scaling-down lithographic dimensions with block-copolymer materials: 10nm-sized
features with PS-b-PMMA

X. Chevalier; C. Nicolet; R. Tiron; A. Gharbi; M. Argoud; J. Pradelles; M. Delalande; G. Cunge; G. Fleury; G. Hadziioannou; C. Navarro

doi:10.1117/12.2011405

26 March 2013 Scaling-down lithographic dimensions with block-copolymer materials: 10nm-sized features with PS-b-PMMA

X. Chevalier, C. Nicolet, R. Tiron, A. Gharbi, M. Argoud, J. Pradelles, M. Delalande, G. Cunge, G. Fleury, G. Hadziioannou, C. Navarro

Author Affiliations +

Proceedings Volume 8680, Alternative Lithographic Technologies V; 868006 (2013) https://doi.org/10.1117/12.2011405
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

PS-b-PMMA block-copolymers systems synthesized on an industrial scale, and satisfying microelectronic’s requirements for metallic contents specifications, are studied in terms of integration capabilities for lithographic applications. We demonstrate in particular that this kind of polymer can efficiently achieve periodic features close to 10 nm. These thin-films can be transferred in various substrates through dry-etching techniques. The self-assembly optimization for each polymer is first performed on free-surface, leading to interesting properties, and the changes in self-assembly rules for low molecular weight polymers are investigated and highlighted through different graphoepitaxy approaches. The enhancements in self-assembly capabilities toward low periodic polymers, as well as the broad range of achievable features sizes render PS-b-PMMA system very attractive ones for lithographic CMOS applications. We conclude showing that high-χ polymers materials developed in Arkema’s laboratories can be efficiently used to reduce the pattern’s size beyond the ones of PS-b-PMMA based BCP’s capabilities.

Citation Download Citation

X. Chevalier, X. Chevalier, C. Nicolet, C. Nicolet, R. Tiron, R. Tiron, A. Gharbi, A. Gharbi, M. Argoud, M. Argoud, J. Pradelles, J. Pradelles, M. Delalande, M. Delalande, G. Cunge, G. Cunge, G. Fleury, G. Fleury, G. Hadziioannou, G. Hadziioannou, C. Navarro, C. Navarro, } "Scaling-down lithographic dimensions with block-copolymer materials: 10nm-sized features with PS-b-PMMA", Proc. SPIE 8680, Alternative Lithographic Technologies V, 868006 (26 March 2013); doi: 10.1117/12.2011405; https://doi.org/10.1117/12.2011405

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