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26 March 2013 Novel fluorinated compounds for releasing material in nanoimprint lithography
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In recent years, utilization and reduction of pattern size are following nanoimprint lithography (NIL) quickly. In nanoimprinting, since it is contact printing, a higher separation force might cause damages to the master and imprinting tool, degradation in pattern quality as well. There is a mold-release characteristic of a master and resin as one of the biggest subjects in utilization. Although Optool DSXTM (DAIKIN Ind. Ltd.) is an de facto standard as mold releasing reagent now, there is a problem in durability at UV-NIL. Then, we focused on the material which raises the mold-release characteristic of resist. The new fluorinated copolymers based on α-chloroacrylate and the low molecular weight perfluorocompounds, added to resist was developed. In this paper, we will report these synthesis method, specific properties such as static contact angle, releasing force and further fluorinated compounds were segregated resin surface.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tsuneo Yamashita, Hisashi Mitsuhashi, and Masamichi Morita "Novel fluorinated compounds for releasing material in nanoimprint lithography", Proc. SPIE 8680, Alternative Lithographic Technologies V, 86800D (26 March 2013);

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