26 March 2013 Quantifying throughput improvements for electron-beam lithography using a suite of benchmark patterns
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Abstract
The Vistec VB300 Gaussian electron-beam lithography system at the College of Nanoscale Science and Engineering (CNSE) in Albany routinely exposes 300 mm wafers to meet the requirements of nano-patterning for metrology and process tool qualification. CNSE and Vistec are partners in a continuous throughput improvement program. The first stage of this program has recently been implemented on CNSE’s VB300. To quantify the improvements, we have defined a suite of benchmark patterns to compare throughput “before and after”, which we plan to use throughout the entire program. These benchmark patterns show throughput improvements of up to a factor of 2.5 on the VB300. We believe this method of measuring throughput could be applied to other lithography systems that exhibit a throughput dependency on pattern type.
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John G. Hartley, Nigel Crosland, Robert C. Dowling, Philip C. Hoyle, Andrew McClelland, Martin Turnidge, James H. Smith, "Quantifying throughput improvements for electron-beam lithography using a suite of benchmark patterns", Proc. SPIE 8680, Alternative Lithographic Technologies V, 86800P (26 March 2013); doi: 10.1117/12.2011664; https://doi.org/10.1117/12.2011664
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