26 March 2013 Exploration of the directed self-assembly based nano-fabrication design space using computational simulations
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Abstract
Properly designed geometries of directing pre-patterns broaden the set of lattice symmetries and the local arrangements of patterns achievable by directed self-assembly (DSA) of block copolymers (BCP), compared to the ones achievable in un-directed, bulk systems. We present the results of parametric computational simulation studies, concentrating on exploring the chemoepitaxy or graphoepitaxy directing geometries yielding the DSA structures needed for typical integrated circuits, but not achievable in bulk, undirected annealing of BCP. The examples include the parametric studies of chemoepitaxy and graphoepitaxy DSA patterns etch-transferrable, respectively, into isolated lines and contact hole arrays. The results of the DSA defect simulations are also presented and discussed.
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Azat Latypov, Moshe Preil, Gerard Schmid, Ji Xu, He Yi, Kenji Yoshimoto, Yi Zou, "Exploration of the directed self-assembly based nano-fabrication design space using computational simulations", Proc. SPIE 8680, Alternative Lithographic Technologies V, 868013 (26 March 2013); doi: 10.1117/12.2011238; https://doi.org/10.1117/12.2011238
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