26 March 2013 Novel error mode analysis method for graphoepitaxial directed self-assembly lithography based on the dissipative particle dynamics method
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Abstract
Directed self-assembly lithography (DSAL), which combines self-assembling materials and a lithographically defined prepattern, is a potential candidate to extend optical lithography beyond 22 nm. To take full advantage of DSAL requires diminishing not only systematic error modes but also random error modes by carefully designing a lithographically defined prepattern and precisely adjusting process conditions. To accomplish this with satisfactory accuracy, we have proposed a novel method to evaluate DSAL error modes based on simulations using dissipative particle dynamics (DPD). We have found that we can estimate not only systematic errors but also random errors qualitatively by simulations.
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Katsuyoshi Kodera, Katsuyoshi Kodera, Shimon Maeda, Shimon Maeda, Satoshi Tanaka, Satoshi Tanaka, Shoji Mimotogi, Shoji Mimotogi, Yuriko Seino, Yuriko Seino, Hiroki Yonemitsu, Hiroki Yonemitsu, Hironobu Sato, Hironobu Sato, Tsukasa Azuma, Tsukasa Azuma, } "Novel error mode analysis method for graphoepitaxial directed self-assembly lithography based on the dissipative particle dynamics method", Proc. SPIE 8680, Alternative Lithographic Technologies V, 868015 (26 March 2013); doi: 10.1117/12.2011439; https://doi.org/10.1117/12.2011439
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