Multifunctional hardmask neutral layer for directed self-assembly (DSA) patterning

Douglas J. Guerrero; Mary Ann Hockey; Yubao Wang; Eric Calderas

doi:10.1117/12.2011567

26 March 2013 Multifunctional hardmask neutral layer for directed self-assembly (DSA) patterning

Douglas J. Guerrero, Mary Ann Hockey, Yubao Wang, Eric Calderas

Proceedings Volume 8680, Alternative Lithographic Technologies V; 86801P (2013) https://doi.org/10.1117/12.2011567
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

Micro-phase separation for directed self-assembly (DSA) can be executed successfully only when the substrate surface on which the block co-polymer (BCP) is coated has properties that are ideal for attraction to each polymer type. The neutral underlayer (NUL) is an essential and critical component in DSA feasibility. Properties conducive for BCP patterning are primarily dependent on “brush” or “crosslinked” random co-polymer underlayers. Most DSA flows also require a lithography step (reflection control) and pattern transfer schemes at the end of the patterning process. A novel multifunctional hardmask neutral layer (HM NL) was developed to provide reflection control, surface energy matching, and pattern transfer capabilities in a grapho-epitaxy DSA process flow. It was found that the ideal surface energy for the HM NL is in the range of 38-45 dyn/cm. The robustness of the HM NL against exposure to process solvents and developers was identified. Process characteristics of the BCP (thickness, bake time and temperature) on the HM NL were defined. Using the HM NL instead of three distinct layers – bottom anti-reflective coating (BARC) and neutral and hardmask layers – in DSA line-space pitch tripling and contact hole shrinking processes was demonstrated. Finally, the capability of the HM NL to transfer a pattern into a 100-nm spin-on carbon (SOC) layer was shown.

Citation Download Citation

Douglas J. Guerrero, Mary Ann Hockey, Yubao Wang, and Eric Calderas "Multifunctional hardmask neutral layer for directed self-assembly (DSA) patterning", Proc. SPIE 8680, Alternative Lithographic Technologies V, 86801P (26 March 2013); https://doi.org/10.1117/12.2011567

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available