5 April 2013 PS-b-PAA as a high χ polymer for directed self-assembly: a study of solvent and thermal annealing processes for PS-b-PAA
Author Affiliations +
Abstract
Poly(styrene)-b-poly(acrylic acid) copolymers (PS-b-PAA) was shown to be one promising material for achieving substantially smaller pitch patterns than PS-b-PMMA while still retaining high etch contrast and application for chemoepitaxy. Phase separation of acetone vapor annealed PS-b-PAA (Mw=16,000 g/mol with 50:50 volume ratio of PS: PAA) on PS brush achieved a lamellar morphology with a pattern pitch size (L0) of 30 nm. However the thermal annealing of the same PS-b-PAA generated a dramatically larger pitch size of 43 nm. SEM and GPC analysis revealed that the intermolecular crosslinking during thermal annealing process has increased the effective N (degree of polymerization), which suggests that even a small amount of crosslinking would lead to big pitch change. Thus, PS-b-PAA is not suitable for fast thermal annealing process as it loses pitch size control due to PAA crosslinking.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jing Cheng, Jing Cheng, Richard A. Lawson, Richard A. Lawson, Wei-Ming Yeh, Wei-Ming Yeh, Nathan D. Jarnagin, Nathan D. Jarnagin, Laren M. Tolbert, Laren M. Tolbert, Clifford L. Henderson, Clifford L. Henderson, } "PS-b-PAA as a high χ polymer for directed self-assembly: a study of solvent and thermal annealing processes for PS-b-PAA", Proc. SPIE 8680, Alternative Lithographic Technologies V, 86801V (5 April 2013); doi: 10.1117/12.2021414; https://doi.org/10.1117/12.2021414
PROCEEDINGS
4 PAGES


SHARE
Back to Top