Process enhancements for negative tone development (NTD)

Go Noya; Kazuma Yamamoto; Naoki Matsumoto; Yukie Takemura; Maki Ishii; Yoshihiro Miyamoto; Masahiro Ishii; Tatsuro Nagahara; Georg Pawlowski

doi:10.1117/12.2012077

26 March 2013 Process enhancements for negative tone development (NTD)

Go Noya, Kazuma Yamamoto, Naoki Matsumoto, Yukie Takemura, Maki Ishii, Yoshihiro Miyamoto, Masahiro Ishii, Tatsuro Nagahara, Georg Pawlowski

Author Affiliations +

Proceedings Volume 8680, Alternative Lithographic Technologies V; 86802E (2013) https://doi.org/10.1117/12.2012077
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

The negative tone development (NTD) process has proven benefits for superior imaging performance in 193nm lithography. Shrink materials, such as AZ® RELACS® have found widespread use as a resolution enhancement technology in conventional 248nm (DUV), 193 nm dry (ArF) and 193 nm immersion (ArFi) lithography. Surfactant rinses, such as AZ® FIRM® are employed as yield enhancement materials to improve the lithographic performance by avoiding pattern collapse, eliminating defects, and improving CDU. This paper describes the development and recent achievements obtained with new shrink and rinse materials for application in NTD patterning processes.

Citation Download Citation

Go Noya, Kazuma Yamamoto, Naoki Matsumoto, Yukie Takemura, Maki Ishii, Yoshihiro Miyamoto, Masahiro Ishii, Tatsuro Nagahara, and Georg Pawlowski "Process enhancements for negative tone development (NTD)", Proc. SPIE 8680, Alternative Lithographic Technologies V, 86802E (26 March 2013); https://doi.org/10.1117/12.2012077

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