26 March 2013 Process enhancements for negative tone development (NTD)
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Abstract
The negative tone development (NTD) process has proven benefits for superior imaging performance in 193nm lithography. Shrink materials, such as AZ® RELACS® have found widespread use as a resolution enhancement technology in conventional 248nm (DUV), 193 nm dry (ArF) and 193 nm immersion (ArFi) lithography. Surfactant rinses, such as AZ® FIRM® are employed as yield enhancement materials to improve the lithographic performance by avoiding pattern collapse, eliminating defects, and improving CDU. This paper describes the development and recent achievements obtained with new shrink and rinse materials for application in NTD patterning processes.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Go Noya, Go Noya, Kazuma Yamamoto, Kazuma Yamamoto, Naoki Matsumoto, Naoki Matsumoto, Yukie Takemura, Yukie Takemura, Maki Ishii, Maki Ishii, Yoshihiro Miyamoto, Yoshihiro Miyamoto, Masahiro Ishii, Masahiro Ishii, Tatsuro Nagahara, Tatsuro Nagahara, Georg Pawlowski, Georg Pawlowski, } "Process enhancements for negative tone development (NTD)", Proc. SPIE 8680, Alternative Lithographic Technologies V, 86802E (26 March 2013); doi: 10.1117/12.2012077; https://doi.org/10.1117/12.2012077
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