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18 April 2013 Control of inspection for EUV substrates and mask blanks
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Defect inspection of EUV substrates and mask blanks must be controlled consistently to ensure repeatable and accurate defect counts. Initial sensitivity must be maintained without producing false counts. Various constructed and native defect monitors are created on substrates to track inspection tool performance. Remedies are applied to an inspection tool when monitors go out of control.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Milton Godwin, Teki Ranganath, and Andy Ma "Control of inspection for EUV substrates and mask blanks", Proc. SPIE 8681, Metrology, Inspection, and Process Control for Microlithography XXVII, 868112 (18 April 2013);


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