10 April 2013 Advanced overlay stability control with correction per exposure on immersion scanners
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Abstract
In this paper, we propose advanced overlay stability control improving conventional stability control, Baseliner™ and reference wafers with new vertical structure for effective stability control. We verify improved overlay stability control experimentally by using this stability control method. Also we suggest that additional improvements can be achieved by controllable process terms. For focus stability control, we make reference wafers which can measure overlay and focus simultaneously on the same wafer to minimize monitoring wafers.
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Jinkyu Han, Jinkyu Han, Jinseok Heo, Jinseok Heo, Chan Hwang, Chan Hwang, Jeongho Yeo, Jeongho Yeo, } "Advanced overlay stability control with correction per exposure on immersion scanners", Proc. SPIE 8681, Metrology, Inspection, and Process Control for Microlithography XXVII, 86811D (10 April 2013); doi: 10.1117/12.2011379; https://doi.org/10.1117/12.2011379
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