18 April 2013 Design-based metrology for development and manufacturing applications
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Abstract
This work presents how the combination of EDA and CDSEM tools enable development and manufacturing engineers to collect CDSEM data of a large diversity of features and contexts seamlessly for OPC model calibration and validation, process development, and inline manufacturing monitoring. We will present the application and results of a solution proposed in a previously published paper[1] and then review the benefits of enabling development and manufacturing engineers to make metrology-related decisions within their environments. Finally, new applications for automated CDSEM recipe generation and data collection will be discussed.
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Peter Brooker, Michael Lee, Ezequiel Vidal Russel, Shimon Levi, Sylvain Berthiaume, William A. Stanton, Travis Brist, "Design-based metrology for development and manufacturing applications", Proc. SPIE 8681, Metrology, Inspection, and Process Control for Microlithography XXVII, 868123 (18 April 2013); doi: 10.1117/12.2014182; https://doi.org/10.1117/12.2014182
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