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10 April 2013 Hybrid approach to optical CD metrology of directed self-assembly lithography
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Abstract
Directed Self Assembly (DSA) for contact layers is a challenging process in need of reliable metrology for tight process control. Key parameters of interest are guide CD, polymer CD, and residual polymer thickness at the bottom of the guide cavity. We show that Optical CD (OCD) provides the needed performance for DSA contact metrology. The measurement, done with a multi-channel spectroscopic reflectometry (SR) system, is enhanced through elements of a Holistic Metrology approach such as Injection and Hybrid Metrology.
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Stephane Godny, Masafumi Asano, Akiko Kawamoto, Koichi Wakamoto, Kazuto Matsuki, Cornel Bozdog, Matthew Sendelbach, Igor Turovets, Ronen Urenski, and Renan Milo "Hybrid approach to optical CD metrology of directed self-assembly lithography", Proc. SPIE 8681, Metrology, Inspection, and Process Control for Microlithography XXVII, 86812D (10 April 2013); https://doi.org/10.1117/12.2012660
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