Feasibility study of resist slimming for SIT

Nicole Saulnier; Chiew-seng Koay; Matthew Colburn; David Hetzer; Michael Cicoria; Jonathan Ludwicki

doi:10.1117/12.2011506

29 March 2013 Feasibility study of resist slimming for SIT

Nicole Saulnier, Chiew-seng Koay, Matthew Colburn, David Hetzer, Michael Cicoria, Jonathan Ludwicki

Proceedings Volume 8682, Advances in Resist Materials and Processing Technology XXX; 86820E (2013) https://doi.org/10.1117/12.2011506
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

Wet chemical slimming of resist can enable a resist mandrel for sidewall-image transfer (SIT) by decreasing the mandrel width and smoothing the mandrel sidewalls. This would reduce the cost of the SIT process. Several key metrics are used to compare the traditional etched mandrel and the slimmed resist mandrel, including: process window, critical dimension uniformity, and defectivity. New resists are shown to have larger process windows after slimming than an etched mandrel process while maintaining comparable critical dimension uniformity. The major challenge to the resist mandrel is the profile post-slim.

Citation Download Citation

Nicole Saulnier, Chiew-seng Koay, Matthew Colburn, David Hetzer, Michael Cicoria, and Jonathan Ludwicki "Feasibility study of resist slimming for SIT", Proc. SPIE 8682, Advances in Resist Materials and Processing Technology XXX, 86820E (29 March 2013); https://doi.org/10.1117/12.2011506

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