Progress in directed self-assembly hole shrink applications

Todd R. Younkin; Roel Gronheid; Paulina Rincon Delgadillo; Boon Teik Chan; Nadia Vandenbroeck; Steven Demuynck; Ainhoa Romo-Negreira; Doni Parnell; Kathleen Nafus; Shigeru Tahara; Mark Somervell

doi:10.1117/12.2012353

29 March 2013 Progress in directed self-assembly hole shrink applications

Todd R. Younkin, Roel Gronheid, Paulina Rincon Delgadillo, Boon Teik Chan, Nadia Vandenbroeck, Steven Demuynck, Ainhoa Romo-Negreira, Doni Parnell, Kathleen Nafus, Shigeru Tahara, Mark Somervell

Author Affiliations +

Proceedings Volume 8682, Advances in Resist Materials and Processing Technology XXX; 86820L (2013) https://doi.org/10.1117/12.2012353
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

Directed Self-Assembly (DSA) has become a promising alternative for generating fine lithographic patterns. Since contact holes are among the most difficult structures to resolve through traditional lithographic means, directed selfassembly applications that generate smaller contact holes are of particular interest to the industry. In this paper, DSA integrations that shrink pre-patterned contact holes were explored. The use of both block copolymers (BCPs)¹ and blended polymer systems² was considered. In addition, both wet³ and dry⁴ techniques were used to develop the central core out of the respective phase-separated morphologies. Finally, the hole patterns created through the various contact hole applications were transferred to substrates of interest with the goal of incorporating them into an IMEC 28 nm node via chain electrical test vehicle for direct, side-by-side comparison.

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Todd R. Younkin, Roel Gronheid, Paulina Rincon Delgadillo, Boon Teik Chan, Nadia Vandenbroeck, Steven Demuynck, Ainhoa Romo-Negreira, Doni Parnell, Kathleen Nafus, Shigeru Tahara, and Mark Somervell "Progress in directed self-assembly hole shrink applications", Proc. SPIE 8682, Advances in Resist Materials and Processing Technology XXX, 86820L (29 March 2013); https://doi.org/10.1117/12.2012353

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