29 March 2013 Study of swelling behavior in ArF resist during development by the QCM method (3): observations of swelling layer elastic modulus
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Abstract
The QCM method allows measurements of impedance, an index of swelling layer viscosity in a photoresist during development. While impedance is sometimes used as a qualitative index of change in the viscosity of the swelling layer, it has to date not been used quantitatively, for data analysis. We explored a method for converting impedance values to elastic modulus (Pa), a coefficient expressing viscosity. Applying this method, we compared changes in the viscosity of the swelling layer in an ArF resist generated during development in a TMAH developing solution and in a TBAH developing solution. This paper reports the results of this comparative study.
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Atsushi Sekiguchi, Atsushi Sekiguchi, } "Study of swelling behavior in ArF resist during development by the QCM method (3): observations of swelling layer elastic modulus", Proc. SPIE 8682, Advances in Resist Materials and Processing Technology XXX, 86821L (29 March 2013); doi: 10.1117/12.2006027; https://doi.org/10.1117/12.2006027
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