29 March 2013 Development of new xanthendiol derivatives applied to the negative-tone molecular resists for EB/EUVL
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Abstract
In this paper, we report the development of new xanthendiol derivatives applied to the negative-tone molecular resists for EB/EUVL. The new xanthendiol derivatives were easily synthesized by the condensation of aldehydes and dihydroxyaromatic compounds. We found 13-biphenyl-13H-benzoxanthen-3,10-diol was showed the good applicability to the raw material for the resist for EB/EUVL. The EB patterning result showed the resist containing xanthendiol derivative could resolve the 30 nm half-pitch pattern. Furthermore sub 30 nm half-pitch patterns were partially resolved.
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Masatoshi Echigo, Masako Yamakawa, Yumi Ochiai, Yu Okada, Takashi Makinoshima, Masaaki Takasuka, "Development of new xanthendiol derivatives applied to the negative-tone molecular resists for EB/EUVL", Proc. SPIE 8682, Advances in Resist Materials and Processing Technology XXX, 86821V (29 March 2013); doi: 10.1117/12.2010926; https://doi.org/10.1117/12.2010926
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