12 April 2013 Effective model-based SRAF placement for full chip 2D layouts
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Abstract
Traditional SRAF placement has been governed by a generation of rules that are experimentally derived based on measurements on test patterns for various exposure conditions. But with the shrinking technology nodes, there are increased challenges in coming up with these rules. Model-based SRAF placement can help in improved overall process window, with less effort. This is true especially for two-dimensional layouts, where SRAF placement conflicts can provide a formidable challenge with varying patterns and sources. This paper investigates the trade-offs and benefits of using model-based SRAF placement over rule-based for various design configurations on a full chip. The impact on cost, time, process-window and performance will be studied. This paper will also explore the benefits and limitations of more complex free-form SRAF and OPC shapes generated by Inverse Lithography Technology (ILT), and strategies for integration into a manufacturable mask.
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Srividya Jayaram, Srividya Jayaram, Pat LaCour, Pat LaCour, James Word, James Word, Alexander Tritchkov, Alexander Tritchkov, } "Effective model-based SRAF placement for full chip 2D layouts", Proc. SPIE 8683, Optical Microlithography XXVI, 86830H (12 April 2013); doi: 10.1117/12.2011611; https://doi.org/10.1117/12.2011611
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