12 April 2013 Lithography imaging control by enhanced monitoring of light source performance
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Reducing lithography pattern variability has become a critical enabler of ArF immersion scaling and is required to ensure consistent lithography process yield for sub-30nm device technologies. As DUV multi-patterning requirements continue to shrink, it is imperative that all sources of lithography variability are controlled throughout the product life-cycle, from technology development to high volume manufacturing. Recent developments of new ArF light-source metrology and monitoring capabilities have been introduced in order to improve lithography patterning control.[1] These technologies enable performance monitoring of new light-source properties, relating to illumination stability, and enable new reporting and analysis of in-line performance.
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Paolo Alagna, Paolo Alagna, Omar Zurita, Omar Zurita, Ivan Lalovic, Ivan Lalovic, Nakgeuon Seong, Nakgeuon Seong, Gregory Rechsteiner, Gregory Rechsteiner, Joshua Thornes, Joshua Thornes, Koen D'havé, Koen D'havé, Lieve Van Look , Lieve Van Look , Joost Bekaert , Joost Bekaert , "Lithography imaging control by enhanced monitoring of light source performance", Proc. SPIE 8683, Optical Microlithography XXVI, 86830S (12 April 2013); doi: 10.1117/12.2013213; https://doi.org/10.1117/12.2013213

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