12 April 2013 A study on the automation of scanner matching
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Scanner matching based on CD or patterning contours has been demonstrated in past works. All of these published works require extensive wafer metrology. In contrast, this work extends a previously proposed optical pattern matching method that requires little metrology by adding the component requirements and the procedure for creating an automation flow. In a test case, we matched an ASML XT:1900i using a DOE to an ASML NXT:1950i scanner using FlexRay. The matching was conducted on a 4x nm process test layer as a development vehicle for the 2x nm product nodes. The paper summarizes the before and after matching data and analysis, with future opportunities for improvements suggested.
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Yuan He, Alexander Serebryakov, Scott Light, Vivek Jain, Erik Byers, Ronald Goossens, Zhi-Yuan Niu, Peter Engblom, Scott Larson, Bernd Geh, Craig Hickman, Hoyoung Kang, "A study on the automation of scanner matching", Proc. SPIE 8683, Optical Microlithography XXVI, 86830W (12 April 2013); doi: 10.1117/12.2014402; https://doi.org/10.1117/12.2014402

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