12 April 2013 A study on the automation of scanner matching
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Scanner matching based on CD or patterning contours has been demonstrated in past works. All of these published works require extensive wafer metrology. In contrast, this work extends a previously proposed optical pattern matching method that requires little metrology by adding the component requirements and the procedure for creating an automation flow. In a test case, we matched an ASML XT:1900i using a DOE to an ASML NXT:1950i scanner using FlexRay. The matching was conducted on a 4x nm process test layer as a development vehicle for the 2x nm product nodes. The paper summarizes the before and after matching data and analysis, with future opportunities for improvements suggested.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yuan He, Yuan He, Alexander Serebryakov, Alexander Serebryakov, Scott Light, Scott Light, Vivek Jain, Vivek Jain, Erik Byers, Erik Byers, Ronald Goossens, Ronald Goossens, Zhi-Yuan Niu, Zhi-Yuan Niu, Peter Engblom, Peter Engblom, Scott Larson, Scott Larson, Bernd Geh, Bernd Geh, Craig Hickman, Craig Hickman, Hoyoung Kang, Hoyoung Kang, "A study on the automation of scanner matching", Proc. SPIE 8683, Optical Microlithography XXVI, 86830W (12 April 2013); doi: 10.1117/12.2014402; https://doi.org/10.1117/12.2014402

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