Adjustment of image decomposition mode and reflection criterion focusing on critical dimension uniformity and exposure dose effectiveness under diffraction effects in optical microlithography using a digital micromirror device

Manseung Seo; Haeryung Kim

doi:10.1117/12.2011428

12 April 2013 Adjustment of image decomposition mode and reflection criterion focusing on critical dimension uniformity and exposure dose effectiveness under diffraction effects in optical microlithography using a digital micromirror device

Manseung Seo, Haeryung Kim

Author Affiliations +

Proceedings Volume 8683, Optical Microlithography XXVI; 86830X (2013) https://doi.org/10.1117/12.2011428
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

In the optical microlithography in concern, a digital micromirror device plays the role of a digital mask, and the diffraction effect due to reflections off of a square micromirror may not be negligible. The projected beam image may not be a typical uniform square or pointed circular beam. Therefore, existing image decomposition modes and reflection criteria developed for a typical beam may not be appropriate for lithography under the diffraction effect. In this study, to improve the critical dimension uniformity and the exposure dose effectiveness, a novel image decomposition mode based on the proxy delta configuration is proposed. A successive set of proxy delta parameters which produce a honeycomb decomposed structure is utilized to implement a proxy delta lithography system that allows the usage of a typical square image array without the hassle of projecting a square mirror array into a rectangular image array using an aspheric micro lens array. A reflection criterion employing intensity weighted occupancy patterns that account for the diffracted beam profile is utilized to adjust the binary reflections. The potential for a honeycomb decomposition mode based on the proposed proxy delta configuration to improve the critical dimension uniformity and the exposure dose effectiveness is demonstrated.

Citation Download Citation

Manseung Seo and Haeryung Kim "Adjustment of image decomposition mode and reflection criterion focusing on critical dimension uniformity and exposure dose effectiveness under diffraction effects in optical microlithography using a digital micromirror device", Proc. SPIE 8683, Optical Microlithography XXVI, 86830X (12 April 2013); https://doi.org/10.1117/12.2011428

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available