12 April 2013 Compatibility of optimized source over design changes in the foundry environment
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Abstract
It is evident that as industry moves towards 28 and 20 nm large scale production, more flexibility in source is eminent for better process margin. In this paper, we review different realms of illumination optimization techniques with combinations of currently available source shapes along with pixelated source optimization. However, it has been observed in the past that any optimized source heavily relies on the patterns that are used in optimization. Therefore, it is critical that early in the resolution enhancement technology (RET) selection flow, test patterns are carefully chosen. The patterns should maintain the balance of cycle time for source tuning and at the same time ensure fidelity in accuracy. This type of trade-off becomes easier with an automated pattern selection tool that can guarantee coverage and accuracy together. Different approaches of pattern selection are demonstrated in this paper and the knowledge is transferred to development activities for 28 nm layers. In this paper we investigate compatibility of sources that are tuned over a set of design database and its adaptability of optimized source over small variations in design. At the end we demonstrate a reliable solution that could be integrated early in RET development and easily adapted for the production environment.
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Jojo Pei, Feng Shao, Omar ElSewefy, Cynthia Zhu, Verne Xu, Yu Zhu, Liguo Zhang, Xuelong Shi, Qingwei Liu, Aasutosh Dave, "Compatibility of optimized source over design changes in the foundry environment", Proc. SPIE 8683, Optical Microlithography XXVI, 86831M (12 April 2013); doi: 10.1117/12.2013704; https://doi.org/10.1117/12.2013704
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