Mask strategy and layout decomposition for self-aligned quadruple patterning

Weiling Kang; Chen Feng; Yijian Chen

doi:10.1117/12.2011261

29 March 2013 Mask strategy and layout decomposition for self-aligned quadruple patterning

Weiling Kang, Chen Feng, Yijian Chen

Author Affiliations +

Proceedings Volume 8684, Design for Manufacturability through Design-Process Integration VII; 86840E (2013) https://doi.org/10.1117/12.2011261
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

Self-aligned quadruple patterning (SAQP) process is a proven technique for deep nano-scale IC manufacturing, while its mask design and layout decomposition strategy is less intuitive. In this paper, we examine both 2- and 3-mask SAQP process characteristics and develop various decomposition methods to achieve higher feature density and 2-D design flexibility. It is demonstrated that by generating assisting mandrels, SAQP layout decomposition can be degenerated into a SADP decomposition problem for which mature algorithms already exist in our EDA industry. Moreover, a spacer-expansion mask concept is introduced and a grouping/coloring algorithm to assign feature colors is developed for 3-mask SAQP layout decomposition. Finally, several 2-D layouts are successfully decomposed, showing the functionality of the decomposition method we proposed.

Citation Download Citation

Weiling Kang, Chen Feng, and Yijian Chen "Mask strategy and layout decomposition for self-aligned quadruple patterning", Proc. SPIE 8684, Design for Manufacturability through Design-Process Integration VII, 86840E (29 March 2013); https://doi.org/10.1117/12.2011261

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