29 March 2013 Mask strategy and layout decomposition for self-aligned quadruple patterning
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Self-aligned quadruple patterning (SAQP) process is a proven technique for deep nano-scale IC manufacturing, while its mask design and layout decomposition strategy is less intuitive. In this paper, we examine both 2- and 3-mask SAQP process characteristics and develop various decomposition methods to achieve higher feature density and 2-D design flexibility. It is demonstrated that by generating assisting mandrels, SAQP layout decomposition can be degenerated into a SADP decomposition problem for which mature algorithms already exist in our EDA industry. Moreover, a spacer-expansion mask concept is introduced and a grouping/coloring algorithm to assign feature colors is developed for 3-mask SAQP layout decomposition. Finally, several 2-D layouts are successfully decomposed, showing the functionality of the decomposition method we proposed.
© (2013) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Weiling Kang, Weiling Kang, Chen Feng, Chen Feng, Yijian Chen, Yijian Chen, "Mask strategy and layout decomposition for self-aligned quadruple patterning", Proc. SPIE 8684, Design for Manufacturability through Design-Process Integration VII, 86840E (29 March 2013); doi: 10.1117/12.2011261; https://doi.org/10.1117/12.2011261

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